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Silicon Wafer Cleaning Equipment

Home / Wafer Processing Applications / Silicon Wafer Cleaning Equipment
Modutek strives to partner with our customers by developing the most effective and reliable silicon wafer cleaning equipment solutions. Our staff of knowledgeable experts can provide application specific processing solutions in semiconductor etching, resist strip, advanced wet etch and more. The industry demands for effective and efficient semiconductor components requires that any contaminants and impurities be removed during the micro-fabrication process. Without it, the performance and functionality of components can be hindered, affecting end costs and potentially damaging the reputation of the manufacturer.

Microelectronic cleaning processes has become our specialty at Modutek. We’ve been the premier supplier of semiconductor manufacturing equipment for over thirty five years, and that experience is manifest in the design of our advanced wafer cleaning equipment. We offer various options for cleaning wafers that can be customized to meet the needs of your application. Our team of engineers and software developers works with you from the initial planning stages and design approval, to the final acceptance and installation process at your facility. You can be assured that you won’t find a better option when it comes to high quality and reliable equipment.

Silicon Wafer Cleaning Equipment Options:

Silicon wafer cleaning equipment is integral to semiconductor manufacturing, serving a critical role in the production of high-quality, reliable semiconductor devices. Modutek offers various equipment options to optimize wafer cleaning performance with precision, efficiency, and compatibility with advanced manufacturing processes.

The cleaning equipment options can include the following:

  • Automated Wafer Cleaning: Modutek incorporates automated wafer cleaning in their fully automated and semi-automated wet bench systems that are tailored for specific cleaning processes. This can include RCA or SC1 & SC2 clean and other cleaning processes with optimum control and consistency. Automation aids in reproducibility, which is paramount for clients needing to maintain strict quality standards.
  • Megasonic Cleaning Systems: Modutek can incorporate megasonic cleaning that uses high-frequency sound waves that enables efficient removal of particles from the wafer surface without damaging the substrate. This is particularly important for clients requiring delicate handling of thin wafers or advanced device structures.
  • Ozone Cleaning Solutions: This incorporates the use of ozone cleaning methods that remove organic contaminants. This is a key consideration for those who need to integrate their cleaning processes into ultra-clean manufacturing environments.
  • DI Water Heaters: Deionized water heaters that can accurately control the temperature of the water used in the cleaning process are crucial for technology manufacturers looking for precision and repeatability in their cleaning protocols.

Each of these equipment options addresses distinct aspects of the wafer cleaning process, such as minimizing contamination, ensuring process repeatability, and integrating with automated manufacturing lines.

Machine

Silicon Wafer Cleaning Equipment Options:

Silicon wafer cleaning equipment is integral to semiconductor manufacturing, serving a critical role in the production of high-quality, reliable semiconductor devices. Modutek offers various equipment options to optimize wafer cleaning performance with precision, efficiency, and compatibility with advanced manufacturing processes.

The cleaning equipment options can include the following:

  • Automated Wafer Cleaning: Modutek incorporates automated wafer cleaning in their fully automated and semi-automated wet bench systems that are tailored for specific cleaning processes. This can include RCA or SC1 & SC2 clean and other cleaning processes with optimum control and consistency. Automation aids in reproducibility, which is paramount for clients needing to maintain strict quality standards.
  • Megasonic Cleaning Systems: Modutek can incorporate megasonic cleaning that uses high-frequency sound waves that enables efficient removal of particles from the wafer surface without damaging the substrate. This is particularly important for clients requiring delicate handling of thin wafers or advanced device structures.
  • Ozone Cleaning Solutions: This incorporates the use of ozone cleaning methods that remove organic contaminants. This is a key consideration for those who need to integrate their cleaning processes into ultra-clean manufacturing environments.
  • DI Water Heaters: Deionized water heaters that can accurately control the temperature of the water used in the cleaning process are crucial for technology manufacturers looking for precision and repeatability in their cleaning protocols.
Each of these equipment options addresses distinct aspects of the wafer cleaning process, such as minimizing contamination, ensuring process repeatability, and integrating with automated manufacturing lines.
Machine

Custom-fit Teflon Tanks

Our silicon wafer cleaning equipment features Teflon heated tanks available in either a TFa Series configuration for our Recirculating Overflow Baths, a TI Series configuration for our Static Baths, or a TT Series configuration for our Ambient Baths. Each is available in either a standard single or double load capacity, or custom sizes fit your specifications to fit easily into your wafer cleaning equipment. Beyond the options in configurations, you can choose between two heating options: Teflon inline heating or overflow weir immersion heating. Our Teflon tanks have a standard operating temperature range between 30⁰C – 100⁰C, with a heat-up rate of 2⁰C – 3⁰C per minute.
teflon tanks

Custom-fit Teflon Tanks

Our silicon wafer cleaning equipment features Teflon heated tanks available in either a TFa Series configuration for our Recirculating Overflow Baths, a TI Series configuration for our Static Baths, or a TT Series configuration for our Ambient Baths. Each is available in either a standard single or double load capacity, or custom sizes fit your specifications to fit easily into your wafer cleaning equipment.Beyond the options in configurations, you can choose between two heating options: Teflon inline heating or overflow weir immersion heating. Our Teflon tanks have a standard operating temperature range between 30⁰C – 100⁰C, with a heat-up rate of 2⁰C – 3⁰C per minute.
teflon tanks

Call Us to Discuss Your Manufacturing Requirements

We offer the most advanced and reliable silicon wafer cleaning equipment in the business. As a leader in the semiconductor manufacturing and equipment industry, our team of experts utilize the most advanced cutting-edge technology available to provide a solution that meets your manufacturing requirements. In addition our equipment includes a one year warranty on parts and our customer support network. Contact Modutek for a free consultation or quote on any of our products

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